JPH0229542U - - Google Patents
Info
- Publication number
- JPH0229542U JPH0229542U JP10780788U JP10780788U JPH0229542U JP H0229542 U JPH0229542 U JP H0229542U JP 10780788 U JP10780788 U JP 10780788U JP 10780788 U JP10780788 U JP 10780788U JP H0229542 U JPH0229542 U JP H0229542U
- Authority
- JP
- Japan
- Prior art keywords
- drain
- gate
- source
- drift layer
- silicon substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 4
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10780788U JPH0720929Y2 (ja) | 1988-08-16 | 1988-08-16 | 高耐圧半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10780788U JPH0720929Y2 (ja) | 1988-08-16 | 1988-08-16 | 高耐圧半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0229542U true JPH0229542U (en]) | 1990-02-26 |
JPH0720929Y2 JPH0720929Y2 (ja) | 1995-05-15 |
Family
ID=31342550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10780788U Expired - Lifetime JPH0720929Y2 (ja) | 1988-08-16 | 1988-08-16 | 高耐圧半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0720929Y2 (en]) |
-
1988
- 1988-08-16 JP JP10780788U patent/JPH0720929Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0720929Y2 (ja) | 1995-05-15 |
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